| 摘要 |
<p>It is an object to provide a high-performance and compact exposure apparatus which can perform a projection exposure operation with satisfactory optical performance by using a plurality of compact projection optical systems each capable of ensuring a sufficient working distance and having excellent imaging performance, while preventing a decrease in throughput even in a large exposure area. An exposure apparatus for projecting and exposing an image of a mask (10) into a plate (30) while moving a mask and a plate has a first projection optical system (35a) and a second projection optical system each of which is real-size and both-side telecentric and forms the erect image of the mask on the plate. The first or second projection optical system (35a) has a refraction optical system (S1) having a positive refracting power, and a concave reflecting mirror (M1) for reflecting a light beam from the refraction optical system toward the refraction optical system. <IMAGE></p> |
