发明名称 Process for cutting out a block of material and formation of a thin film
摘要 A process for cutting out a block of material ( 10 ) comprising the following stages: (a) the formation in the block of a buried zone ( 12 ), embrittled by at least one stage of ion introduction, the buried zone defining at least one superficial part ( 14 ) of the block, (b) the formation at the level of the embrittled zone of at least one separation initiator ( 30, 36 ) by the use of a first means of separation chosen from amongst the insertion of a tool, the injection of a fluid, a thermal treatment and/or implantation of ions of an ionic nature different from that introduced during the preceding stage, and (c) the separation at the level of the embrittled zone of the superficial part ( 14 ) of the block from a remaining part ( 16 ), called the mass part, from the separation initiator ( 30, 36 ) by the use of a second means, different from the first means of separation and chosen from among a thermal treatment and/or the application of mechanical forces acting between the superficial part and the embrittled zone. Application for the manufacture of components for micro-electronics, opto-electronics or micro-mechanics.
申请公布号 US2006191627(A1) 申请公布日期 2006.08.31
申请号 US20060372542 申请日期 2006.03.10
申请人 COMMISSARIAT A I'ENERGIE ATOMIQUE (CEA) 发明人 ASPAR BERNARD;LAGACHE CHRYSTELLE
分类号 B32B38/10;H01L21/265;B32B37/00;B81C1/00;H01L21/02;H01L21/20;H01L21/301;H01L21/762;H01L27/12 主分类号 B32B38/10
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