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发明名称
DRAIN APPARATUS OF ETCHING EQUIPMENT
摘要
申请公布号
KR960006408(Y1)
申请公布日期
1996.07.24
申请号
KR19930008348U
申请日期
1993.05.18
申请人
LG SEMICONDUCTOR CO., LTD.
发明人
HWANG, CHANG - NOH
分类号
H01L21/302;(IPC1-7):H01L21/302
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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