| 摘要 |
An apparatus for cleaning a spin chamber is provided to prevent damage of a wafer due to a chemical and to detect leakage of the chemical by using a splash preventing wall and a leakage detection sensor. A splash preventing wall(20) consists of a side wall(21) and a front wall(22). The side wall has a height enough for preventing a chemical splash in a spin chamber during a process. The front wall has a wafer incoming and outgoing gate(23) for allowing a robot arm to transfer a wafer. A leakage detection sensor for detecting a leakage of a chemical is comprised of a leakage detection ring, a controller, and a display unit.
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