发明名称 Extracting ion stream from high vacuum chamber into low vacuum chamber esp. for analysis of surface of solid
摘要 The method extracts an ion stream (6) from a chamber (1) of a high vacuum into a chamber (4) of low vacuum through a wall (5) between the two chambers (1,4). The wall is provided in a region with a thin ion beam film (5) between the chambers (1,4). The ion stream (6) is moved from the high vacuum chamber (1) through the film (5) into the low vacuum chamber (4). The thin ion beam film (5) is an element with a uniform crystal orientation. The film element (5) preferably comprises a thin single crystal layer of pyrographite. The single crystal used may be e.g. silicon crystal, diamond or graphite.
申请公布号 DE19600298(A1) 申请公布日期 1996.07.18
申请号 DE19961000298 申请日期 1996.01.05
申请人 AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY, MINISTRY OF INTERNATIONAL TRADE & INDUSTRY, TOKIO/TOKYO, JP 发明人 HORINO, YUJI, IKEDA, OSAKA, JP;FUJII, KANENAGA, HYOGO, JP;CHAYAHARA, AKIYOSHI, IKEDA, OSAKA, JP;KINOMURA, ATSUSHI, IKEDA, OSAKA, JP;MOKUNO, YOSHIAKI, IKEDA, OSAKA, JP
分类号 H01J37/08;H01J5/18;H01J33/04;H01J37/301;(IPC1-7):H01J37/301;H01J37/16 主分类号 H01J37/08
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