摘要 |
<p>PCT No. PCT/FR94/01091 Sec. 371 Date Mar. 25, 1996 Sec. 102(e) Date Mar. 25, 1996 PCT Filed Sep. 20, 1994 PCT Pub. No. WO95/09136 PCT Pub. Date Apr. 6, 1995The interphase is formed by nanometric scale sequencing of a plurality of different constituents including at least a first constituent that intrinsically presents a lamellar microtexture, and at least a second constituent that is suitable for protecting the first against oxidation. A plurality of elementary layers of a first constituent of lamellar microtexture, e.g. selected from pryolytic carbon, boron nitride, and BC3 are formed in alternation with one or more elementary layers of a second constituent having a function of providing protection against oxidation and selected, for example, from SiC, Si3N4, SiB4, SiB6, and a codeposit of the elements Si, B, and C. The elementary layers of the interphase are preferably less than 10 nanometers thick and they are formed by chemical vapor infiltration or deposition in pulsed form.</p> |