发明名称 Charge transfer device with reduced parasitic capacitances for improved charge transferring
摘要 A charge transfer device formed on a semiconductor substrate comprising: a charge transfer section formed on the semiconductor substrate for transferring charges, a floating gate having a floating gate diffusion layer formed on the semiconductor substrate for accumulating the charges transferred from the charge transfer section, an output gate section formed between the charge transfer section and the floating gate on the semiconductor substrate, and a charge detecting circuit electrically connected to the floating gate for outputting a voltage corresponding to the amount of the charges accumulated in the floating gate diffusion layer, the output gate section having a first output gate region adjacent to the charge transfer means and a second output gate region adjacent to the floating gate diffusion layer, the first output gate region having a first output gate electrode formed thereon with an insulating film therebetween, the second output gate region having a second output gate electrode formed thereon with an insulating film therebetween, a dc voltage being applied to the gate electrode, and an output voltage being applied to the second output gate electrode from the charging detecting circuit.
申请公布号 US5536956(A) 申请公布日期 1996.07.16
申请号 US19950487887 申请日期 1995.06.07
申请人 SONY CORPORATION 发明人 KAWAMOTO, SEIICHI;MAKI, YASUHITO;NARABU, TADAKUNI;HIRAMA, MASAHIDE
分类号 H01L29/423;H01L29/768;(IPC1-7):H01L27/148 主分类号 H01L29/423
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