| 摘要 |
An integrated circuit has an interconnection pattern which is recessed in the insulating layer, for example, an oxide layer. A groove is etched in the insulating layer corresponding to the metal pattern by means of a mask which is the inverted image of the interconnection pattern during manufacture. Etching is continued until contact windows are fully opened. To prevent the oxide between the contact windows also being removed, a conductive etching stopper layer is provided in the oxide layer. A layer already present in the process is used for this etching stopper layer, for example, a polycrystalline silicon layer, so that extra process steps are made redundant.
|
