SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF

摘要

PURPOSE: To reduce wiring capacitance regarding a semiconductor device with a plurality of wiring patterns formed with intervals. CONSTITUTION: A semiconductor device contains wirings 13 arranged and formed on a foundation insulating film 12 with intervals, dummy patterns 14 formed between the wiring 13 on the base insulating film 12 with intervals and formed in the same layers as the wirings 13 and an insulating film covering the dummy patterns 14 and the wirings 13 and having cavities 17 inside between the dummy patterns 14 and the wirings 13.