APPARATUS FOR CLEANING A CHAMBER IN A AMORPHOUS CARBON-FILM DEPOSITING PROCESS AND METHOD OF CLEANING THE CHAMBER USING THE APPARATUS

摘要

An apparatus for cleaning a chamber in an amorphous carbon-film depositing process and a method of cleaning the chamber using the same are provided to supply the third plasma gas having fluorine gas to a third gas supply part for cleaning organic impurities which remain on an inner wall of a reaction chamber and shortening cleaning time. A gas preventing shower head includes gas supply modules(210a,210b), a gas separating module(220), and gas spraying modules(230). First and second gases are supplied to the gas supply modules separately. The gas supply modules include outer and inner supply pipes which are separated from each other. The first and second gases are dispersed to the gas separating modules separately. The gas separating module includes first and second dispersion areas(220a,220b). The first gas is dispersed to the first dispersion areas, and the second gas is dispersed to the second dispersion areas. Divided areas of the second dispersion areas are formed with a plurality of spraying parts(225b). The second gas is sprayed to the gas spraying modules. The first gas is sprayed to the gas spraying modules through spaces(225a) covering the spraying parts. The first and second gases are sprayed into a reaction chamber. A third gas includes fluorine gas to clean the inside of the reaction chamber.