LIQUID PRECURSOR FOR CUBIC-PHASE PASSIVATING/BUFFER FILM
摘要
A chemical composition consists essentially ((t-amyl)GaS)4. The chemical composition can be employed as a liquid precursor for metal organic chemical vapor deposition to thereby form a cubic-phase passivating/buffer film, such as gallium sulphide.
申请公布号
WO9620943(A1)
申请公布日期
1996.07.11
申请号
WO1996US00210
申请日期
1996.01.05
申请人
PRESIDENT AND FELLOWS OF HARVARD COLLEGE;GALLIA, INC.;BARRON, ANDREW, R.;POWER, MICHAEL, B.;MACINNES, ANDREW, N.
发明人
BARRON, ANDREW, R.;POWER, MICHAEL, B.;MACINNES, ANDREW, N.
