发明名称 A soft metal conductor and method of making
摘要 <p>A soft metal conductor for use in a semiconductor device that has an upper-most layer consisting of grains having grain sizes sufficiently large so as to provide a substantially scratch-free surface upon polishing in a subsequent chemical mechanical polishing step. <IMAGE></p>
申请公布号 EP0721216(A2) 申请公布日期 1996.07.10
申请号 EP19950119793 申请日期 1995.12.15
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 JOSHI, RAJIV, VASANT;TEJWANI, MANU JAMNADAS
分类号 H01L21/28;H01L21/304;H01L21/3205;H01L21/768;H01L23/52;H01L23/522;H01L23/532;H01L29/43;(IPC1-7):H01L23/532 主分类号 H01L21/28
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