| 摘要 |
PURPOSE:To prevent scumming and to improve developability and plate wear by incorporating a specific high-polymer compd. into an under coating layer of a photosensitive compsn. layer contg. a diazonium compd. and polyurethane resin. CONSTITUTION:The high-polymer compd. having a sulfonic acid group in the molecule is incorporated into the under coating layer of the photosensitive compsn. layer contg. the diazonium compd. and the polyurethane resin. p-Styrene sulfonic acid, 2-acrylamide-2-methyl propane sulfonic acid, etc., are used for the high-polymer compd. and there is no limit in the mol.wt. range thereof as far as said compd. is soluble in solvent. The amt. of the monomer unit having the sulfonic acid group to be incorporated into the high-polymer compd. is adequately 1-100mol.%, more preferably 5-100mol.%. The coating amt. thereof is adequately about 0.0001-1g/m<2>, more preferably 0.0005-0.2g/m<2>. |
