| 摘要 |
<p>PURPOSE: To eliminate the need for a gas feed pipeline, to easily move the equipment and to prevent the infiltration of mist in the same way as before by opening the bottom plate around a rotating shaft and supplying a gas onto the rear of the substrate from the opening with a fan. CONSTITUTION: A photoresist dripped on the surface of a substrate 25 is spread over the entire surface of the substrate 25 by the centrifugal force to form a film with uniform thickness. As a result, a liq. agent such as a photoresist shaken off when the film is formed is splashed as the mist, and a turbulence is generated on the periphery of the substrate 25 by the rotation. Accordingly, a flow straightening plate 28 is engaged with a bottom plate 22 at the rear of the substrate 25 including a turntable 24 to prevent the infiltration of the mist. Further, a fan 29 is mounted in the opening 27 for a rotating shaft 23, the air around the bottom plate 22 is sucked as the rotating shaft 23 is rotated and horizontally blown off from the clearance between the substrate 25 and the flow straightening plate 28 in all directions.</p> |
