摘要 |
PURPOSE: To provide a polishing device which is constituted to uniformly polish an object to be polished without using slurry. CONSTITUTION: In a polishing head which effects reciprocation in parallel to a surface to be polished and rotational movement in a surface vertical to a surface to be polished, a polishing device is provided to control the polishing pressure of a polishing tape to a constant value and uniformly polish the surface to be polished. A polishing head is provided with a drilled first L-shapes plate 32 and a vertical stretch body 21 protruded vertically from a hole. A polishing pad 22 is arranged at the tip of the first L-shaped plate and presses the polishing tape. A non-seal cylinder 34 is fixed to the vertical stretch body 21 in parallel to the first L-shaped plate 32. The pressure of a polishing pad is adjusted by one end of the non-seal cylinder. The rotation angle and the polishing pressure of a polishing head are fed as a pulse signal to a control part. To keep a polishing pressure at a constant value, the rotation angle of the motor and the feed of air to the cylinder are controlled to an optimum. |