发明名称 FIXED ABRASIVE GRAIN TYPE POLISHING SURFACE PLATE
摘要 PURPOSE: To provide the polishing surface plate, which can obtain the high surface smoothness even in the case where lapping polishing is performed to a material to be polished, which is formed by combining different kinds of materials. CONSTITUTION: The surface layer of a surface plate 10 in the polishing surface side is provided with a polishing layer 20, which includes diamond abrasive grains 22 and grain-shape tin powder 24 provided with the minimum diameter sufficiently larger than the maximum diameter of the diamond abrasive grains 22. At the time of rapping polishing, since the surface plate 10 works as a grinding wheel, free abrasive grain liquid is unnecessary, and even in the case where a material 28 to be polished is formed by combing different kinds of material at a different hardness, generation of working stage difference due to the free abrasive machining is restricted.
申请公布号 JPH08174428(A) 申请公布日期 1996.07.09
申请号 JP19940321909 申请日期 1994.12.26
申请人 NORITAKE CO LTD 发明人 YAMAGUCHI YUKIO;ITO SHIGETOSHI
分类号 B24B37/12;B24D3/00;B24D3/02;B24D7/00 主分类号 B24B37/12
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