发明名称 METHOD FOR FINE PROCESSING AND FINE PROCESSING METHOD
摘要 PURPOSE: To provide a matter for fine processing capable of realizing precise processing by setting heating quantity and a heating time to a necessarily min. degree and reducing deterioration and deformation due to the heat exerted on the periphery of a processed part to the utmost. CONSTITUTION: In a matter for fine processing wherein the membrane (magnetic layer 10a) formed on the surface of the matter (base film 9) easy to generate thermal deformation is irradiated with laser beam to form fine recessed patterns (optical tracks 12) on the membrane, a substance bonded to oxygen to generate heat is added to the membrane (magnetic layer 10a).
申请公布号 JPH08174669(A) 申请公布日期 1996.07.09
申请号 JP19940325660 申请日期 1994.12.27
申请人 HITACHI MAXELL LTD 发明人 KOUMIYOU MASATOMO
分类号 B23K26/00;B29C59/14;C09D5/23;C09D7/12;G11B5/73;G11B5/82 主分类号 B23K26/00
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