| 摘要 |
<p>PURPOSE: To obtain a film prevented from being deteriorated in barrier properties as the film expands/shrinks at the time of working, bag-making, charging, and retort-processing by a method wherein an SiOx layer enhanced in spreading properties and flexing properties is provided on a film to be deposited as a transparent retort packaging film superior in barrier properties. CONSTITUTION: A transparent barrier layer is provided by a plasma chemical deposition method on at least one surface of a substrate film 1. A continuous layer (SiOx layer 2) containing a compound of silicon oxide and one or more elements selected from carbon, hydrogen, silicon, and oxygen and a heat sealing resin layer 6 are laminated through a reactive curing adhesive layer 4.</p> |
