发明名称 |
Plasma processing method and plasma processing apparatus |
摘要 |
A plasma processing apparatus comprises a vacuum chamber, a plasma beam generator arranged in the vacuum chamber, and a main hearth located in the vacuum chamber and is for carrying out a step of a plasma beam produced by the plasma beam generator to the main hearth. The plasma processing apparatus further comprises a permanent magnet and a hearth coil arranged in the vicinity of the main hearth to be concentric with a center axis of the main hearth to be concentric with a center axis of the main hearth. The meltability of a material and the flight distribution of the vapor particles derived from a vaporizable material are adjusted by varying an electric current supplied to the hearth coil. <IMAGE> |
申请公布号 |
EP0720206(A1) |
申请公布日期 |
1996.07.03 |
申请号 |
EP19950120678 |
申请日期 |
1995.12.28 |
申请人 |
SUMITOMO HEAVY INDUSTRIES, LTD. |
发明人 |
SAKEMI, TOSHIYUKI;TANAKA, MASARU |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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