发明名称 Plasma processing method and plasma processing apparatus
摘要 A plasma processing apparatus comprises a vacuum chamber, a plasma beam generator arranged in the vacuum chamber, and a main hearth located in the vacuum chamber and is for carrying out a step of a plasma beam produced by the plasma beam generator to the main hearth. The plasma processing apparatus further comprises a permanent magnet and a hearth coil arranged in the vicinity of the main hearth to be concentric with a center axis of the main hearth to be concentric with a center axis of the main hearth. The meltability of a material and the flight distribution of the vapor particles derived from a vaporizable material are adjusted by varying an electric current supplied to the hearth coil. <IMAGE>
申请公布号 EP0720206(A1) 申请公布日期 1996.07.03
申请号 EP19950120678 申请日期 1995.12.28
申请人 SUMITOMO HEAVY INDUSTRIES, LTD. 发明人 SAKEMI, TOSHIYUKI;TANAKA, MASARU
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
主权项
地址