| 摘要 |
The present invention relates to a thin film deposition apparatus for improving uniformity of a deposition thin film. The thin film deposition apparatus includes: a first crucible for containing a deposition material; a second crucible for containing a deposition material different from that contained in the first crucible; a first distribution tube for injecting the deposition material of the first crucible; a second distribution tube arrange in parallel to the first distribution tube to inject the deposition material of the second crucible; a first distribution tube nozzle unit including a plurality of first distribution tube nozzles formed on the first distribution tube in a radial direction; a second distribution tube nozzle unit including a plurality of second distribution tube nozzles formed on the second distribution tube; a flexible bellows tube for connecting an inlet of each distribution tube to an opening of each crucible; a heating unit for heating a deposition material; and an elevating unit for minimizing a heat exposing time of the deposition material in each crucible by allowing the crucibles to vertically move up or down as the deposition material in each crucible is consumed. The second distribution nozzles extend to approach the first distribution tube nozzles, and injection ends of the second distribution nozzles are angled in parallel to the first distribution tube nozzles, so that the deposition thin film may be more uniformly formed and the quality of a device may be improved, thereby improving the product yield. |
