发明名称 |
Focal plane phase-shifting lithography |
摘要 |
The invention relates to a lithographic system for patterned exposure of radiation-sensitive resist. The system comprises a radiation source (122), a mask (124), a converging optical element (126) having a focal plane, and a phase-shifting optical element (132) disposed at the focal plane of the converging optical element. The lithographic system produces enhanced images (128). <IMAGE> |
申请公布号 |
EP0720055(A1) |
申请公布日期 |
1996.07.03 |
申请号 |
EP19950120364 |
申请日期 |
1995.12.21 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
COUFAL, HANS-JUERGEN;GRYGIER, ROBERT KEITH |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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