ROTARY TREATER FOR SUBSTRATE

摘要

PURPOSE: To prevent the adhesion of particles on the underside side of a substrate generated with the release of the vacuum suction operation of the substrate by a spin chuck completely after rotary treatment. CONSTITUTION: A filter 50 capturing dust flowing in the direction of a substrate W through the suction path of a hollow shaft and the suction hole 12 of a spin chuck 10 from the inside of a suction chamber at the time of the release of atmospheric air in the suction chamber 32 is interposed in the suction path 16 of the hollow shaft 14.