SEMICONDUCTOR MANUFACTURING DEVICE

摘要

PURPOSE: To provide the title semiconductor manufacturing device capable of improving the reliability uppon the attraction to static electricity. CONSTITUTION: Within the title semiconductor manufacturing device composed of a vacuum vessel 2 to be a treatment chamber internally covered with an insulating material, a specimen base 6 mounting a semiconductor wafer 1 in the vacuum vessel 2 to be impressed with DC power source 3, and low frequency power source 5 as well as an counter electrode 7 electrically insulated from the specimem base 6 but impressed with high-frequency power supply 4, the semiconductor wafer 1 is static electrically attracted to the specimen base 6 by the potential difference between the plasma potential generated by the high-frequency discharge between the specimen base 6 and the counter electrode 7.