| 摘要 |
<p>First, a mask (2) having a predetermined pattern is formed on a surface to be processed of a magnetic head slider substrate (1) containg aluminum oxide and titanium carbide as main components. The magnetic head slider substrate (1) with this mask (2) formed thereon is set on an electrode provided in an etching apparatus. A reactive gas and an inert gas are introduced into an excitation zone (14) in the etching apparatus, and these gases are plasma excited, a high frequency bias voltage being applied to the above-mentioned electrode. Consequently, reactive gas ions (4) and an inert gas ions (5) obtained by the plasma excitation are drawn to the magnetic head slider substrate (1), and the reactive etching by the reactive gas ions (4) and the sputter etching by the inert gas ions (5) are carried out simultaneously.</p> |
