FORMING METHOD OF BPSG FILM

摘要

The BPSG (boron phosphosilicate glass) film is prepared by using gas such as 0.04-0.08sccm SiH4, 5.74-6.74sccm O2, 0.2-0.4sccm PH3 and 0.115-0.175sccm B2H6, where the concentration of phosphorus is 10.17-14.17 mol% and that of boron is 4.19-8.19 mol%. The depositing temp. is 405-445 deg.C, and the thickness of BPSG is 4000-6000A.