发明名称 |
Water-developable photosensitive resin composition |
摘要 |
<p>A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: (1) a granular copolymer produced by polymerizing a monomer mixture comprising: (i) an aliphatic conjugated diene monomer; (ii) a monomer expressed by the general formula (I): <CHEM> (in which R<1> represents a hydrogen atom or a methyl group, R<2> represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20); (iii) a monomer having at least two addition-polymerizable groups, and (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; (2) a photo-polymerizable unsaturated monomer; (3) an amino group-containing compound, and (4) a photo-polymerization initiator.</p> |
申请公布号 |
EP0718695(A2) |
申请公布日期 |
1996.06.26 |
申请号 |
EP19950119122 |
申请日期 |
1995.12.05 |
申请人 |
NIPPON PAINT CO. LTD.;JAPAN SYNTHETIC RUBBER CO., LTD. |
发明人 |
KANDA, KAZUNORI;UEDA, KOICHI;KAKIUCHI, TADAHIRO;MURAMOTO, HISAICHI;YASUDA, KENJI;SATO, HOZUMI;KOSHIMURA, KATSUO;NISHIOKA, TAKASHI |
分类号 |
G03F7/027;G03F7/00;G03F7/028;G03F7/033;G03F7/32;(IPC1-7):G03F7/033 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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