| 摘要 |
PROBLEM TO BE SOLVED: To provide a transfer chamber which allows for transfer of a transferred object in a clean state, by keeping the internal humidity properly to maintain the chemical component removal function by a chemical filter.SOLUTION: A transfer chamber for delivering a wafer, as a transferred object, between the processor side 6 by using a transfer robot 2 provided internally includes: a circulation path CL formed internally for circulating gas; a chemical filter unit 7 as a chemical filter provided in the middle of the circulation path CL; a humidity detector HG2 as humidity detection means for detecting the internal humidity; gas supply means NS for supplying gas to the inside; and moisture supply means HS for supplying moisture to the inside. The transfer chamber is configured so that the moisture supply means HS is operated based on a humidity detection value detected by the humidity detection means.SELECTED DRAWING: Figure 5 |
