发明名称 Photoresist compositions
摘要 <p>Polymers having an average molecular weight Mw (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: <CHEM> <CHEM> in which R1, R2, R3 and R4 independently of one another are hydrogen, methyl or halogen, R5 and R6 independently of one another are C1-C6alkyl, R7, R8, R9 and R10 independently of one another are hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen, and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient <MATH> which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10 </= Q </= 0.50, are suitable as binders for DUV photoresists of high processing stability and flow resistance.</p>
申请公布号 EP0718317(A2) 申请公布日期 1996.06.26
申请号 EP19950309073 申请日期 1995.12.13
申请人 OCG MICROELECTRONIC MATERIALS, INC. 发明人 MERTESDORF, CARL-LORENZ;SCHACHT, HANS-THOMAS;MUENZEL, NORBERT;FALCIGNO, PASQUALE ALFRED
分类号 C08F8/00;C08F8/04;C08F12/00;C08F16/02;C08F16/14;C08F16/16;C08F112/04;C08F212/14;C08F216/10;C08F216/14;C08F216/16;G03F7/00;G03F7/004;G03F7/033;G03F7/039;H01L21/027;H05K3/00;H05K3/28;(IPC1-7):C08F8/00 主分类号 C08F8/00
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