Washing of wafers and wafer washing and drying apparatus

摘要

An apparatus comprises a washing unit including a plurality of brush roller pairs for washing wafers, arranged in a row in a wafer conveying direction such that they are rotated in different directions, that is, some of them being rotated in the wafer conveying direction, and the others being rotated in the opposite direction to the waver conveying direction, their brush bundles being arranged helically in the axial direction, at least tips of the brush hair constituting the brush hair bundles being non-linear, and a drying unit including air stream blow-out means for blowing out air streams upstream with respect to the wafer conveying direction. <IMAGE>