发明名称 TARGET FOR HIGH PROFITABLE SPUTTERING APPARATUS
摘要 PURPOSE:The titled target obtd. by providing holes for gushing out of inert gas on a sputtering surface, with wich a sputtering speed can be maintained always equal to a sputtering speed of a clean surface, without the surface of the target being contaminated with noxious gases.
申请公布号 JPS53114787(A) 申请公布日期 1978.10.06
申请号 JP19770029267 申请日期 1977.03.18
申请人 ULVAC CORP 发明人 HAYASHI CHIKARA
分类号 C23C14/00;C23C14/34 主分类号 C23C14/00
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