| 摘要 |
PURPOSE: To obtain a non-eluting antimicrobial member exhibiting excellent antimicrobial and ant-fungi action over a long term. CONSTITUTION: An Ag vapor deposited film is formed by a ion beam aided vapor deposition method for vapor depositing Ag on the surface of a base material such as a metal, a coating film, a plastics, a rubber, a ceramic, a fiber with the irradiation of ion beam. The Ag vapor deposited film is preferably grown into 0.01-5μm film thickness at >=0.1kV accelerating voltage and 0.1-50Å/sec vapor deposition rate. Ag in the vapor deposited film has high activity and shows a catalytic action to convert oxygen in air or water to active oxygen. The Ag vapor deposited film shows antimicrobial and anti-fungi action by the generated active oxygen, Ag does not elute and excellent antimicrobial and anti-fungi property is kept over a long term.
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