发明名称 Semiconductor device capable of preventing reduction of cut-off frequency by Kark effect even when operated within a high electric current density range
摘要 In a semiconductor device which includes a semiconductor substrate, a collector region of a first conductivity type formed on the semiconductor substrate, a base region of a second conductivity type reverse to the first conductivity type, an emitter region of the first conductivity type formed within the base region, an intermediate semiconductor layer of the second conductivity type is formed within the collector region, an additional semiconductor layer of the first conductivity type is superposed on the intermediate semiconductor layer, and the base region is overlaid on the additional semiconductor layer.
申请公布号 US5530273(A) 申请公布日期 1996.06.25
申请号 US19950528160 申请日期 1995.09.14
申请人 NEC CORPORATION 发明人 NAKAMURA, SATOSHI
分类号 H01L29/73;H01L21/331;H01L29/08;H01L29/10;H01L29/732;(IPC1-7):H01L31/032 主分类号 H01L29/73
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