发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE, AND THE SEMICONDUCTOR DEVICE
摘要 PURPOSE: To improve the accuracy in registering by the manufacturing method in self alignment manner of a semiconductor device, and reduce the manhours. CONSTITUTION: A register mark 13 is made on a substrate 12, and a photoresist pattern 14 is formed by making registration to the mark, and with this photoresis pattern as a mask, electrode material 15 is stacked, and an electrode 16 is formed by lift-off method, and with this electrode 16 as a mask, the board 12 is etched to form an element isolating mesa 17 on the electrode 16 in a self-alignment manner. If necessary, the electrode processing is successively carried out.
申请公布号 JPH08162525(A) 申请公布日期 1996.06.21
申请号 JP19950073099 申请日期 1995.03.30
申请人 NEC CORP 发明人 TOKUSHIMA MASATOSHI
分类号 H01L21/265;H01L21/266;H01L21/28;H01L21/764;(IPC1-7):H01L21/764 主分类号 H01L21/265
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