摘要 |
PURPOSE: To improve the accuracy in registering by the manufacturing method in self alignment manner of a semiconductor device, and reduce the manhours. CONSTITUTION: A register mark 13 is made on a substrate 12, and a photoresist pattern 14 is formed by making registration to the mark, and with this photoresis pattern as a mask, electrode material 15 is stacked, and an electrode 16 is formed by lift-off method, and with this electrode 16 as a mask, the board 12 is etched to form an element isolating mesa 17 on the electrode 16 in a self-alignment manner. If necessary, the electrode processing is successively carried out.
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