| 摘要 |
<p>PURPOSE: To increase the margin for designing and to improve the yield by using a protective layer formed to protect pixel electrodes and signal wires as a mask when a conductive thin film is to be etched. CONSTITUTION: A protective film 18 having insulating property and etching resistance is formed on an ITO (indium tin oxide) thin film only in the area where data signal lines 3 and pixel electrodes 6 are to be formed. Then the ITO thin film exposed to air is subjected to wet etching. Namely, the protective film 18 to protect the data lines 3 and pixel electrodes 6 is used as a mask for wet etching of the ITO thin film. By this method, it is not necessary to remove the mask used for wet etching, so that the number of production processes of the liquid crystal display element is decreased. Accordingly, the liquid crystal display element can be produced at a low cost.</p> |
