| 摘要 |
<p>PURPOSE: To conduct the self-diagnosis of a process stage and a device operation and find trouble in its early stage by deciding whether or not the time difference between the value obtained by calculating a lot processing time and the actual lot processing time or end time is within a permissible range after the lot processing ends, and displaying the decision result when the permissible range is exceeded. CONSTITUTION: The number of wafers of one lot for which exposure process is performed is specified and information on process times required for respective partial processes of the exposure process are set (S1 and S2). Then the time required for the exposure process of one lot or the end time of the process is calculated on the basis of the set number of wafers and the set process time information and then the calculated value is displayed (S3). After the lot process ends, it is decided whether or not the calculated time or the time difference between the time and the actual lot processing time or end time is within the permissible range (S4 and S5). When the time difference is not within the permissible range, it is decided that the lot processing is in trouble and that is displayed to an operator (S6), so that the trouble can be found in its early stage.</p> |
