| 摘要 |
<p>PURPOSE: To manufacture an electron emission element by which a large area is made possible at a low cost by forming element electrodes of a pair of elements on an insulating substrate at distances so that they may be faced to each other, and forming a conductive thin film including an electron emitting part between the element electrodes. CONSTITUTION: A first layer 6 made of conductive materials (Ni, Cr, etc.) is formed on the insulating substrate 1 (quartz glass) by the vacuum evaporation method, and a second layer 7 (a novolak photoresist) is formed on this layer 6 by the vacuum evaporation method. The layer 7 is patterned into the specified shape by using laser 8, the layer 6 is etched by taking the layer 7 on which the pattern is formed as a mask and a gap 9 between electrodes is formed. After the element electrodes 4, 5 are formed by removing the layer 7, a conductive thin film 2 (made of Pt, Pd, etc.) is formed by the vacuum deposition method, the electrification processing called as forming is applied thereto, and an electron emitting part 3 whose structure is changed is formed on a part of the thin film 2. The fine element electrode pattern is formed over the large area at a low cost.</p> |
