| 摘要 |
<p>PURPOSE: To provide a manufacture of a micro-cathode by which micro-cathodes having the uniform shapes and heights can be formed. CONSTITUTION: An insulating layer 31 and a conductive layer 35 are formed on the front surface of a substrate 30. A resist film 38 is formed on the conductive layer 35. The resist film 38 is pattern-processed by the specified pattern by which a cathode hole 44 to be formed. Etching is performed by taking the resist film 38 as a mask, and a cathode hole is formed on the conductive layer 35 and the insulating layer 31. A microcathode is formed in the cathode hole 44 formed on the insulating layer 31. The insulating layer 31 is provided with a layer 33 containing hydrogen, the hydrogen is made previously adding to the insulating layer 31, the hydrogen is made to be generated during etching of the insulating layer 31, and therefore a fluorocarbon-group deposition 41 for preventing the edge of the conductive layer of WSix or the like from falling is formed near the cathode hole 44.</p> |
