发明名称 PHOTO-POLYMERIZATION COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PURPOSE: To provide a photo-polymerization composition and a photosensitive lithographic printing plate shortening the gradation without reducing the sensitivity of the photo-polymerization composition and having high dot image quality and a good safe light property. CONSTITUTION: This photo-polymerization composition contains a polymerizable compound having addition polymerization unsaturated bond, a photo-polymerization initiator, an alkali-soluble polymer compound, and a compound reacted via an exposure to change the absorption spectrum in the region from ultraviolet light to visible light and not changing the solubility in a developer via an exposure. A photosensitive lithographic plate has the photo-polymerization composition layer containing the polymerizable compound having addition polymerization unsaturated bond, the photo-polymerization initiator, and the alkali-soluble polymer compound and an overcoat layer on a base. The overcoat layer contains the compound reacted via an exposure to change the absorption spectrum in the region from ultraviolet light to visible light and not changing the solubility in a developer via an exposure.
申请公布号 JPH08160608(A) 申请公布日期 1996.06.21
申请号 JP19940329989 申请日期 1994.12.05
申请人 KONICA CORP;MITSUBISHI CHEM CORP 发明人 MATSUMURA TOMOYUKI;ISHII NOBUYUKI;KIZU NORIYUKI;MURATA MASAHISA;TSUJI SHIGEO
分类号 G03F7/004;G03F7/00;G03F7/022 主分类号 G03F7/004
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