发明名称 |
PHOTO-POLYMERIZATION COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
PURPOSE: To provide a photo-polymerization composition and a photosensitive lithographic printing plate shortening the gradation without reducing the sensitivity of the photo-polymerization composition and having high dot image quality and a good safe light property. CONSTITUTION: This photo-polymerization composition contains a polymerizable compound having addition polymerization unsaturated bond, a photo-polymerization initiator, an alkali-soluble polymer compound, and a compound reacted via an exposure to change the absorption spectrum in the region from ultraviolet light to visible light and not changing the solubility in a developer via an exposure. A photosensitive lithographic plate has the photo-polymerization composition layer containing the polymerizable compound having addition polymerization unsaturated bond, the photo-polymerization initiator, and the alkali-soluble polymer compound and an overcoat layer on a base. The overcoat layer contains the compound reacted via an exposure to change the absorption spectrum in the region from ultraviolet light to visible light and not changing the solubility in a developer via an exposure. |
申请公布号 |
JPH08160608(A) |
申请公布日期 |
1996.06.21 |
申请号 |
JP19940329989 |
申请日期 |
1994.12.05 |
申请人 |
KONICA CORP;MITSUBISHI CHEM CORP |
发明人 |
MATSUMURA TOMOYUKI;ISHII NOBUYUKI;KIZU NORIYUKI;MURATA MASAHISA;TSUJI SHIGEO |
分类号 |
G03F7/004;G03F7/00;G03F7/022 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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