| 摘要 |
PURPOSE: To provide a chemical amplification type silicone positive resist mate rial suitable for a two-layer resist material, having high sensitivity and high resolution, and excellent in process applicability by using a specific silicone polymer, an acid generating agent, and a specific dissolution inhibitor. CONSTITUTION: A silicone polymer expressed by formula I, an acid generating agent an generating acid by radioactive rays, and a dissolution inhibitor are used as principal constituents. The carboxy group or hydroxy group of a silicone compound expressed by formula II or III is protected by the t-butyl group or t-butoxy carbonyl methyl group for use as the dissolution inhibitor. In the formulas, Q indicates the t-butoxy carbonyl group or t-butoxy carbonyl methyl group, (n) indicates an integer of 1-3, (x), (m) are x+m=1, and (x) is non-zero. R<1> indicates the methyl group of phenyl group, R<2> indicates the carboxyethyl group or p-hydroxyphenyl alkyl group, (x) indicates the trimethylsilyl group or triphenylsilyl group, and (a), (b) are integers of 1-50. |
