| 摘要 |
<p>A method for plasma processing, e.g., etching and film formation, using a microwave plasma. Microwaves of a specific mode are locally generated. The diffusion distance of the microwaves is so determined that the microwaves are diffused and propagated in a specific mode. The cross-sectional area of the propagating space of the microwaves is gradually changed over the distance. After propagated through the distance, the microwaves are introduced into a plasma discharging area. In the plasma discharging area, a plasma whose plasma density distribution at the central part of the plasma is higher than that at the peripheral part is generated, so that a sample in the processing chamber is processed uniformly.</p> |
