发明名称 Reversing orientation of sputtering screen to avoid contamination
摘要 A sputtering apparatus deposits a layer of material on a substrate. The apparatus includes a screening member, such as a plate collimator or a tube collimator, located between the target and substrate. A motor drive reverses the respective positions of the two opposite sides of the screening device which respectively face the substrate and the target.
申请公布号 EP0717431(A1) 申请公布日期 1996.06.19
申请号 EP19950118430 申请日期 1995.11.23
申请人 APPLIED MATERIALS INC. 发明人 FORSTER, JOHN;VAN GOGH, JAMES S.;TEPMAN, AVI
分类号 C23C14/34;C23C14/56;H01J37/34;H01L21/203 主分类号 C23C14/34
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