| 摘要 |
The invention relates to a device and a method for cleaning a filter (7) disposed between a chamber contaminated with particles and a pump station. Herein a feedline (21) for oxygen or for an oxygen/inert gas mixture to the filter (7) is provided which is equipped with an arrangement (11) influencing the flow of gas. Moreover, the device has a drainage (20) for gaseous reaction products and, if necessary, inert gas from the filter (7), which is provided with an arrangement (15) influencing the throughflow of this gas.
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