| 摘要 |
PURPOSE: To suppress interposition of an air bubble by a method wherein after arranging preliminarily aslant a base plate or an existing resin cured layer or a transparent plate in a resin solution, it is restored to a horizontal state to bring a correct horizontal surface to the resin solution into contact with the solution. CONSTITUTION: After feeding a specified amount of a photo-setting resin 13 into a thin plate type resin bath 11, a shaping base plate 11 is lowered onto a solution surface of the resin 13 with a going up and down device 19. In that case, before bringing all the area of a next layer formed surface 25 on a bottom surface of the base plate 15 into contact with the solution surface of the resin 13, the going up and down device 19 is made to pivot in either direction by centering a rotation axis, and the base plate 15 is inclined to the horizontal resin 13 solution surface. At first, it is lowered so that the next layer formed layer 25 on one end 15a side of the base plate 15 sinks first of all. Thereafter, a pivot posture of the going up and down device 19 is gradually restored to a vertical position at that position, and lastly the other end 15b of the base plate 15 is restored to a horizontal state so that the resin 13 solution surface sinks. At last, all the area of the next layer formed surface 15 on the base plate 25 is certainly submerged under the resin 13 solution surface. |
