| 摘要 |
PURPOSE: To industrially advantageously obtain the subject aqueous solution useful as a surfactant having least skin irritation at a high yield in a short time by reacting a specific tertiary amine with a hydrogen peroxide solution in the presence of a specific tungsten compound. CONSTITUTION: (A) A compound expressed by formula I [R1 is an (un)saturated 8-22C (branched) aliphatic hydrocarbon group; R2 and R3 are each methyl or (hydroxy)ethyl] and (B) a hydrogen peroxide solution are reacted in the presence of (C) an acid containing tungsten in a molecule or a salt of the acid [e.g. (sodium or ammonium) phosphotungstate, silicotungstic acid or (ammonium) tungstate] to afford the object aqueous solution of the compound expressed by formula II. Preferably, the component A is adjusted to pH <=7 in a solution dispersed or dissolved in water and its using amount is 0.01-5wt.% based on the component B, and the components A and B are mixed with water before reacting with the component C in obtaining the object aqueous solution. |
