| 发明名称 |
Single crystal quartz thin film and preparation thereof |
| 摘要 |
A single crystal quartz thin film having a thickness of 5 nm to 50 mu m can be prepared by forming the thin film on a single crystal substrate by a sol-gel process and peeling the thin film from the substrate. The present invention can provide the single crystal quartz thin film at a low price without a large and complex apparatus. |
| 申请公布号 |
EP0716167(A2) |
申请公布日期 |
1996.06.12 |
| 申请号 |
EP19950119102 |
申请日期 |
1995.12.05 |
| 申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
TANAKA, MOTOYUKI;IMAI, TAKAHIRO;FUJIMORI, NAOJI |
| 分类号 |
C30B5/00;H03H3/02;H03H9/19 |
主分类号 |
C30B5/00 |
| 代理机构 |
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