发明名称 Resin forming compositions
摘要 Disclosed is an aromatic diamine compound represented by the formula (I) <IMAGE> (I) wherein R is H or CH3. Also disclosed is a bismaleimide compound represented by the formula (IV) <IMAGE> (IV) <IMAGE> wherein R is H or CH3, A resin forming composition comprising these compounds is also disclosed. The compounds are useful as raw materials for resins, and the resin forming composition and the resin can provide excellent heat resistance and impact resistance and low hygroscopicity.
申请公布号 US5525704(A) 申请公布日期 1996.06.11
申请号 US19950547517 申请日期 1995.10.24
申请人 MITSUI TOATSU CHEMICALS, INC. 发明人 TAMAI, SHOJI;YAMAYA, NORIMASA;OHTA, MASAHIRO;YAMAGUCHI, AKIHIRO
分类号 C07C201/12;C07C205/38;C07C213/02;C07C217/90;C07D207/44;C07D207/452;C08G73/12;(IPC1-7):C08G73/10 主分类号 C07C201/12
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