发明名称 PELLICLE RELEASING METHOD AND DEVICE THEREFOR
摘要 <p>PURPOSE: To easily release a pellicle without damaging a photomask by dipping the part where the pellicle is adhered to the photomask in the hot water at a specified temp. to lower the adhesive strength of an adhesive and then releasing the pellicle. CONSTITUTION: A vessel 21 is filled with hot pure water 22 heated to 50-100 deg.C. A photomask 1, to which a pellicle 5 is adhered, is dipped in the hot water for a specified time and then pulled up to release the pellicle 5. Consequently, since the hot water 22 infiltrates into the adhesive and the strength of the adhesive is lowered, the pellicle 5 is easily released by hand without exerting excess force with a jig., etc., and the photomask 1 is not damaged. Meanwhile, the human body is not adversely affected because hot water is used. Further, the pellicle 5 is clearly released from the photomask with the adhesive adhered to the pellicle, and the glass photomask 1 is not contaminated with the adhesive.</p>
申请公布号 JPH08152709(A) 申请公布日期 1996.06.11
申请号 JP19940293017 申请日期 1994.11.28
申请人 RYODEN SEMICONDUCTOR SYST ENG KK;MITSUBISHI ELECTRIC CORP 发明人 TANAKA SHINICHIRO;WADA SHIGERU;KUSUSE HARUHIKO
分类号 B29C63/00;G03F1/62;H01L21/027;(IPC1-7):G03F1/14 主分类号 B29C63/00
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