发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE: To provide a method of manufacturing a semiconductor device proper to form a via hole for easily attaching a conductor layer uniformly to the via hole in a substantially bowl shape. CONSTITUTION: A photosensitive resin 3 is mounted on a substrate 1 so that thickness, in which the thickness is removed by the grinding of the photosensitive resin 3 in a post-process is added to final required thickness as an insulating layer, is obtained. A cavity is formed to the photosensitive resin 3 by a specified pattern by exposure, development and etching, and the photosensitive resin 3, to which the cavity if formed, is thermoset. When a photosetting layer 6a show by a dotted line and a part of a thermosetting layer 3a in Fig. are ground and removed, a via hole 9 having a substantially bowl shape is formed.
申请公布号 JPH08148566(A) 申请公布日期 1996.06.07
申请号 JP19940288114 申请日期 1994.11.22
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 SHIRAI MASAHARU;TERADA KENJI;TSUKADA YUTAKA;TSUCHIDA SHUHEI
分类号 H01L21/28;H01L21/48;H01L21/768;H01L23/522;H05K3/00;H05K3/46;(IPC1-7):H01L21/768 主分类号 H01L21/28
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