MEASURING METHOD FOR CONCENTRATION IN SPECIAL MATERIAL GAS COMPONENT FOR SEMICONDUCTOR AND SEMICONDUCTOR MANUFACTURING DEVICE

摘要

PURPOSE: To provide a measuring method in concentration of special material gas component for a semiconductor and a semiconductor manufacturing device which can be incorporated in a gas piping system of a semiconductor manufacturing device in-line and with which, with no erroneous connection, gas component and concentration flowing in a gas piping or filled in a gas piping system can be measured. CONSTITUTION: In the middle of a gas pipe path 5 between a gas cylinder 2 containing special material gas for a semiconductor and a semiconductor manufacturing part, a gas detector 3 is assigned in-line for measurement of gas component and concentration. The gas detector 3 may be assigned at a combined pipe path of the pipe path connected to multiple gas cylinders.