| 摘要 |
PURPOSE: To prevent the mixing of colors adjacent to each other by etching a glass substrate to form pixel holes and filling these pixel holes with inks to form color filter layers. CONSTITUTION: A metal film 2a is formed on a substrate 1, and the metal film 2a is processed by photolithography to form openings 2b to obtain a black matrix pattern 2. Then the substrate 1 with the pattern 2 formed is etched by using the pattern 2 as a mask. By using a hydrofluoric acid-base solvent as the etching liquid 3 in this process, only the part where color filter layers 4, 5, 6 are to be formed is etched through the openings 2b. Thus, pixel holes 10 are formed by etching. The pixel holes 10 are filled with water-base inks containing water-soluble resins to form color filter layers 4, 5, 6. In this method, especially, an ink-jet method is preferable to supply the ink drops to the pixel holes 10. |
